Heavy-ion cascade implanter

Heavy-ion cascade implanter

    The heavy-ion cascade implanter is also a homemade equipment. The first implantation was performed in 1984.

    In 1997 the implanter was connected to the Van de Graaff accelerator.

    In 2003 new ion source was installed.

    In 2012 the M-88 spectroscopic ellipsometer (J.A. Woollam Co. Inc.) with rotating analyzer was mounted on the chamber of Heavy Ion Cascade Implanter

The main parameters of the heavy-ion cascade implanter


Acceleration voltage range 120 ÷ 400 kV
Energy stability <2.5 keV
Minimum energy step2.5 keV
Typical beam intensity, scanned0.2 µA *
Ion sourcesDanfysik, Model 910
Sputter ion source
Available ion speciesNobel gases: He+, Ne+, Ne2+, Ar+, Ar2+, Kr+, Kr2+, Xe+, Xe2+
Gases : N+, N2+, O+
Metals : Al+, Ti+, 56Fe+, 57Fe+, Co+, Ni+, Zn+, Pb+, Pb2+, V+
Others : B+, C+, Si+, P+, Sb+, Sb2+, Bi+, Bi2+
High voltage source cascade generator
High vacuum systemturbomolecular, cryo
Operating vacuum in the target chamber 10-4 Pa
Maximum size of the sample16×20 mm
Capability of mass separation 1 a.m.u. at 60 ÷130 **
Dose range 1012 ÷ 2×1017 atom/cm2 *

*depending on ions
**depending on ion source configuration

Beamline
The target chamber of the heavy-ion cascade implanter connected also to the Van de Graaff accelerator.

Contact person: Németh, Attila

Beamtime request

If you are interested in using heavy-ion cascade implanter, beamtime request shall start with filling the form for ion implantation that shall be sent by e-mail to the address nik@wigner.mta.hu . We will contact you shortly to discuss the details. Information is provided for users of the NIK ion implanter about the procedure for submission and evaluation of beamtime request.

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