Heavy-ion cascade implanter

Heavy-ion cascade implanter

    The heavy-ion cascade implanter is also a homemade equipment. The first implantation was performed in 1984.

    In 1997 the implanter was connected to the Van de Graaff accelerator.

    In 2003 new ion source was installed.

    In 2012 the M-88 spectroscopic ellipsometer (J.A. Woollam Co. Inc.) with rotating analyzer was mounted on the chamber of Heavy Ion Cascade Implanter

The main parameters of the heavy-ion cascade implanter

Acceleration voltage range 100 ÷ 450 kV
Energy stability <2.5 keV
Minimum energy step2.5 keV
Maximum beam intensity, full100 µA *
Maximum beam intensity, scanned1 µA *
Ion sourcesHigh current source (Danfysik, Model 910)
Sputter ion source
Available ion speciesNobel gases: H+, H2+, He+, Ne+, Ne2+, Ar+, Ar2+, Kr+, Kr2+, Xe+, Xe2+
Gases : N+, N2+, O+
Metals : Al+, Ti+, 56Fe+, 57Fe+, Co+, Ni+, Pb+, Pb2+, V+
Others : B+, Si+, P+, Sb+, Sb2+, Bi+, Bi2+
Molecular ions: N2O+, BF+
High voltage source cascade generator
High vacuum systemturbomolecular
Operating vacuum in the target chamber 6×10-5 ÷ 10-3 Pa **
Maximum scan size25×50 mm
Sample heating? 600 °C
Sample temperature measurement range300 ÷ 1100 °C (IR temperature sensing)
Capability of mass separation 1 a.m.u. at 60 ÷130 ***
Dose range 1012 ÷ 5×1017 atom/cm2

*depending on ions
**depending on sample temperature
***depending on ion source configuration

The target chamber of the heavy-ion cascade implanter connected also to the Van de Graaff accelerator.

Contact person: Németh, Attila

Beamtime request

If you are interested in using heavy-ion cascade implanter, beamtime request shall start with filling the form for ion implantation that shall be sent by e-mail to the address nik@wigner.mta.hu . We will contact you shortly to discuss the details. Information is provided for users of the NIK ion implanter about the procedure for submission and evaluation of beamtime request.

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